APPARATUS FOR MANUFACTURING A SEMICONDUCTOR CHIP AND A METHOD FOR TREATING AN EXHAUSTING GAS OF THE SAME, CAPABLE OF MOVING A MATERIAL SAMPLED IN A TRAP TO A CONTAINER BY USING PRESSURE GRADIENT

摘要

PURPOSE: An apparatus for manufacturing a semiconductor chip and a method for treating an exhausting gas of the same are provided to collect a material sampled in a trap by using a pressure gradient.;CONSTITUTION: A manufacturing apparatus for a semiconductor(100) comprises a processing chamber(110), an exhausting pump(120), and a trap(130). The semiconductor is reacted in a process chamber. The exhausting pump is connected to the processing chamber through an exhaust pipe. A trap is arranged in the exhaust pipe. The trap collects the exhaust gas facing to the exhausting pump from the processing chamber. The manufacturing apparatus for semiconductor more includes a collection pump(150) and a collection container(140). The collection container is connected to the trap trough collection duct. The collection container stores the material sampled in a trap.;COPYRIGHT KIPO 2010