首页> 外国专利> IMAGE SENSOR CAPABLE OF REMOVING A DANGLING BOND BY OPERATING HIGH PRESSURE ANNEALING PROCESS, AND A MANUFACTURING METHOD THEREOF

IMAGE SENSOR CAPABLE OF REMOVING A DANGLING BOND BY OPERATING HIGH PRESSURE ANNEALING PROCESS, AND A MANUFACTURING METHOD THEREOF

机译:通过高压退火处理能够去除悬空键的图像传感器及其制造方法

摘要

PURPOSE: An image sensor and a manufacturing method thereof are provided to reduce the dark current of the image sensor by executing an annealing process in a high pressure state using gas including at least one among hydrogen, deuterium and tritium.;CONSTITUTION: A transistor structure(15) is formed on a semiconductor substrate(10). A metal wiring layer is formed on the transistor structure. A protective film(30) is formed on the metal wiring layer. A nitride film is formed on the protective film. The semiconductor substrate including the nitride film is annealed in the high pressure. The annealing is executed in the pressure condition of 7~40 atm by using gas including at least one among hydrogen, deuterium, tritium, nitrogen, argon, and helium.;COPYRIGHT KIPO 2010
机译:用途:提供一种图像传感器及其制造方法,以通过使用包含氢,氘和tri中至少一种的气体在高压状态下执行退火工艺来减少图像传感器的暗电流。 (15)形成在半导体衬底(10)上。在晶体管结构上形成金属布线层。在金属布线层上形成保护膜(30)。在保护膜上形成氮化膜。包括氮化膜的半导体衬底在高压下退火。通过使用氢气,氘气,at气,氮气,氩气和氦气中的至少一种,在7〜40 atm的压力条件下进行退火。COPYRIGHTKIPO 2010

著录项

  • 公开/公告号KR20100025940A

    专利类型

  • 公开/公告日2010-03-10

    原文格式PDF

  • 申请/专利权人 DONGBU HITEK CO. LTD.;

    申请/专利号KR20080084698

  • 发明设计人 YANG TAEK SEUNG;

    申请日2008-08-28

  • 分类号H01L27/146;H01L27/14;H01L21/28;H01L21/324;

  • 国家 KR

  • 入库时间 2022-08-21 18:33:09

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