METHOD FOR REMOVING PARTICLES IN AN IMAGE SENSOR MANUFACTURING PROCESS, CAPABLE OF MAINTAINING AN ORIGINAL SHAPE OF A SPACER STRUCTURE AFTER A PARTICLE REMOVING PROCESS

摘要

PURPOSE: A method for removing particles in an image sensor manufacturing process is provided to maintain a spacer structure after removing the particles by efficiently removing silicon particles after forming a spacer using a zeta potential.;CONSTITUTION: A gate including a gate oxide layer(215) and a gate electrode(217) is formed on a semiconductor substrate(210). A spacer insulation layer is formed on the semiconductor substrate with the gate. A spacer(230-1) is formed by etching back the semiconductor substrate with the spacer insulation layer. Particles cohere by reducing a zeta potential of the particles due to a loss of the semiconductor substrate in a spacer forming process by an etch-back method. The cohering particles(240-1) are removed by performing a rinse process.;COPYRIGHT KIPO 2010