首页> 外国专利> PLASMA CLEANING APPARATUS FOR A MOLD CHASE FOR REDUCING A CLEANING TIME BY WASHING A MOLD CHASE USING PLASMA

PLASMA CLEANING APPARATUS FOR A MOLD CHASE FOR REDUCING A CLEANING TIME BY WASHING A MOLD CHASE USING PLASMA

机译:一种用于模具的等离子体清洁装置,用于通过使用等离子体洗涤模具来减少清洁时间

摘要

PURPOSE: A plasma cleaning apparatus for a mold chase washes a mold chase to a reactive gas of a plasma state. A mold chase is washed uniformly.;CONSTITUTION: A plasma cleaning apparatus(1000) for a mold chase comprises a reaction chamber(100), a reaction gas supply area(200), a RF(Radio Frequency) generator(300), a RF matching box(400) and a vacuum pump(500). The reaction chamber has the space for the mold chase. Supplies the reactive gas to a gas supply area is the upper side of the mold chase. The vacuum pump exhausts the reactive gas. The reaction gas supply area individually supplies a reactive gas according to a longitudinal direction of a mold chase.;COPYRIGHT KIPO 2010
机译:用途:用于模架的等离子清洁设备将模架洗涤成等离子体状态的反应气体。模具被均匀洗涤;组成:用于模具的等离子体清洁设备(1000)包括反应室(100),反应气体供应区域(200),RF(射频)发生器(300),射频匹配盒(400)和真空泵(500)。反应室具有用于模具追逐的空间。将反应气体供应到模具框架上侧的气体供应区域。真空泵排出反应气体。反应气体供应区域根据模具的纵向分别供应反应气体。; COPYRIGHT KIPO 2010

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