PURPOSE: A plasma cleaning apparatus for a mold chase washes a mold chase to a reactive gas of a plasma state. A mold chase is washed uniformly.;CONSTITUTION: A plasma cleaning apparatus(1000) for a mold chase comprises a reaction chamber(100), a reaction gas supply area(200), a RF(Radio Frequency) generator(300), a RF matching box(400) and a vacuum pump(500). The reaction chamber has the space for the mold chase. Supplies the reactive gas to a gas supply area is the upper side of the mold chase. The vacuum pump exhausts the reactive gas. The reaction gas supply area individually supplies a reactive gas according to a longitudinal direction of a mold chase.;COPYRIGHT KIPO 2010
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