SOURCE GAS SUPPLYING DEVICE INCLUDING A UNIT FOR PREVENTING OUTFLOW OF A DEPOSITION MATERIAL, CAPABLE OF IMPROVING A LIFETIME AND PERFORMANCE OF A SOURCE GAS SUPPLYING UNIT AND A DEPOSITION CHAMBER

摘要

PURPOSE: A source gas supplying device is provided to reduce a process time and costs by easily removing a powder type deposition material accumulated in a filter with a purge gas.;CONSTITUTION: A source gas supplying device includes a source gas supplying unit(100), a carrying gas supplying unit(200), a carrying gas supplying pipe(400), a source gas supplying pipe(300), and a first unit(131). The source gas supplying unit supplies a source gas for forming a thin film on a substrate inside a deposition chamber by heating a deposition material(130) stored in a container(110). The carrying gas supplying unit supplies a carrying gas for carrying the source gas to the deposition chamber. The carrying gas supplying pipe carries the carrying gas from the carrying gas supplying unit to the source gas supplying unit. The source gas supplying pipe carries the source gas to the deposition chamber. The first unit is included in the container and is connected to the source gas supplying pipe to prevent the outflow of the deposition material.;COPYRIGHT KIPO 2010