METHOD AND AN APPARATUS FOR PRECISELY MODIFYING A SURFACE IN A NANO-IMPRINT LITHOGRAPHY USING A FIRST PRESSURE SYSTEM AND A SECOND PRESSURE SYSTEM

摘要

PURPOSE: A method and an apparatus for precisely modifying a surface in a nano-imprint lithography are provided to minimize the generation of particles in a contact region by holding the internal diameter of the disk with a mandrel.;CONSTITUTION: A mandrel(264) holds a plurality of hard disks. A transfer mechanism transfers the hard disks(260) to a dual-reaction chemical vapor deposition chamber. The dual-reaction chemical vapor deposition chamber operates under a first pressure system and a second pressure system. A vapor is supplied into a chamber(216) and heated. The temperature of the vapor in the chamber is maintained. The chamber includes an auxiliary gas line which controls an active pressure.;COPYRIGHT KIPO 2010