PATTERN TESTING APPARATUS AND A METHOD THEREOF, CAPABLE OF ACHIEVING THE PROFILE MEASUREMENT OF SUB-MICRON SIZED PATTERN WHICH IS DIFFICULT TO MEASURE WITH AN IMAGING METHOD

摘要

PURPOSE: A pattern testing apparatus and a method thereof are provided to rapidly inspect the critical dimension and the height of a sample pattern with maintaining high accuracy by analyzing a detected spectrum.;CONSTITUTION: A pattern testing apparatus method comprises the following steps. Light is directed on the entire area of a sample in one time(230). The topology data of the sample is created by using the reflected light from the sample(240). A spectrum is detected from the topology data of the sample(250). The detected spectrum is analyzed and the critical dimension and the height of the sample pattern are inspected(270). Light is directed on the entire area of a standard mirror in one time(200). The topology data of the standard mirror is created by using the reflected light from the standard mirror(210). A spectrum is detected from the topology data of the standard mirror(220). The spectrum of the sample is compensated by using the spectrum of the standard mirror(260).;COPYRIGHT KIPO 2010