LITHOGRAPHY DEVICE CAPABLE OF INCLUDING A SURFACE MATERIAL BETWEEN TARGET PARTS, AND A METHOD OF IRRADIATING AT LEAST TWO TARGET PARTS

摘要

PURPOSE: A lithography device and a method of irradiating at least two target parts are provided to project a radiation beam which has a cross section along an optical path facing a table in order to simultaneously irradiate at least two target parts.;CONSTITUTION: An illuminator(IL) stores a radiation beams(B) from a radiation source(SO). The illuminator comprises an adjusting part(AM) adjusting the angular intensity distribution of the radiation beams. The radiation beams is irradiated to a patterning device. A substrate table(WT) arranges different target parts(C) within the route of the radiation beams. A first positioning device(PW) and a position sensor(IF) are used to accurately locate the patterning device(MA).;COPYRIGHT KIPO 2010