首页> 外国专利> SOI WIRELESS FREQUENCY SWITCH FOR REDUCING HARMONICS OF A HIGH FREQUENCY BY REMOVING CHARGES INSIDE AN INDUCED CHARGE LAYER

SOI WIRELESS FREQUENCY SWITCH FOR REDUCING HARMONICS OF A HIGH FREQUENCY BY REMOVING CHARGES INSIDE AN INDUCED CHARGE LAYER

机译:SOI无线频率开关,用于通过消除感应电荷层中的电荷来降低高频谐波

摘要

PURPOSE: An SOI(Semiconductor-On-Insulator) radio frequency switch for reducing harmonics of a high frequency is provided to improve the performance of an RF switch by reducing the harmonics through a signal combination.;CONSTITUTION: A first doping type semiconductor region and a second doping type semiconductor region are formed under a buried insulation layer(20) of an SOI substrate. The first doping type semiconductor region has the same doping as the lowermost semiconductor layer(10). The second doping type semiconductor region has the doping opposite to the lowermost semiconductor layer. The first doping type semiconductor region and the second doping type semiconductor region are electrically grounded or forward-biased to the lowermost semiconductor layer within the potential difference which does not exceed 0.6V to 0.8V. The charge formed in the induced charge layer by an electric signal is discharged through an electric contact connected to the first and second doping type semiconductor regions.;COPYRIGHT KIPO 2010
机译:目的:提供一种SOI(绝缘体上半导体)射频开关,用于降低高频谐波,以通过信号组合降低谐波来提高RF开关的性能。组成:第一掺杂型半导体区域和在SOI衬底的掩埋绝缘层(20)下面形成第二掺杂型半导体区域。第一掺杂型半导体区域具有与最低的半导体层(10)相同的掺杂。第二掺杂型半导体区域具有与最下面的半导体层相反的掺杂。第一掺杂型半导体区域和第二掺杂型半导体区域在不超过0.6V至0.8V的电势差内电接地或正向偏置至最下面的半导体层。通过电信号在感应电荷层中形成的电荷通过连接到第一和第二掺杂型半导体区域的电触点放电。COPYRIGHTKIPO 2010

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