PLASMA PROCESSING UNIT, A METHOD AND AN APPARATUS FOR MEASURING TEMPERATURE, CAPABLE OF SIMULTANEOUSLY MEASURING TEMPERATURES OF A PLURALITY OF MEASURING POINTS

摘要

PURPOSE: A plasma processing unit, a method and an apparatus for measuring temperature are provided to measure the temperature of a substrate by forming a temperature-measuring window which tightly sealed.;CONSTITUTION: A vacuum chamber(2) plasma-processes a substrate(W). The substrate is loaded on a loading stand(3). A splitter separates light from light source into measurement-light and reference-light. A reflective unit for the reference-light reflects the reference-light from the splitter. Optical fiber(20 to 23) radiates the measurement-light to the substrate. Collimators(24 to 27) are arranged on the outlet side of the optical fiber.;COPYRIGHT KIPO 2010