首页> 外国专利> DOUBLE-SIDED SILICON STRIP SENSOR FOR DETECTING RADIATION AND METHOD OF MANUFACTURING THE SAME

DOUBLE-SIDED SILICON STRIP SENSOR FOR DETECTING RADIATION AND METHOD OF MANUFACTURING THE SAME

机译:用于检测辐射的双侧硅带传感器及其制造方法

摘要

PURPOSE: A both sided silicon strip sensor for detecting radiation and a manufacturing method thereof are provided to improve sensing performance by using the thickness of the substrate with a PIN diode structure as a sensing region. CONSTITUTION: A plurality of P-type strips(20) is formed on the upper side of an N type semiconductor substrate(10) in a band shape. A plurality of N-type strips(30a,30b) is formed on the lower side of the N type semiconductor substrate in a band shape orthogonal to the plurality of P type strips. A first dielectric layer(22) and a second dielectric layer(32) are formed on the upper side and the lower side of the N type semiconductor substrate. A third dielectric layer(24) and a second fourth dielectric layer(34) are formed on the lower side of the second dielectric layer and the upper side of the first dielectric layer. First and second metal units(25a,35a) detects the charge signal of the corresponding P and N type strips.
机译:目的:提供一种用于检测辐射的双面硅条传感器及其制造方法,以通过使用具有PIN二极管结构的基板的厚度作为感测区域来提高感测性能。构成:多个P型条(20)以带状形成在N型半导体衬底(10)的上侧。在N型半导体衬底的下侧以与多个P型带正交的带状形成有多个N型带(30a,30b)。在N型半导体衬底的上侧和下侧上形成第一介电层(22)和第二介电层(32)。在第二介电层的下侧和第一介电层的上侧上形成第三介电层(24)和第二第四介电层(34)。第一和第二金属单元(25a,35a)检测相应的P和N型带的充电信号。

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