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TARGETING PLASMA INJECTOR CAPABLE OF INJECTING AN ION ONLY INTO A TARGET WAFER
TARGETING PLASMA INJECTOR CAPABLE OF INJECTING AN ION ONLY INTO A TARGET WAFER
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机译:目标等离子体注入器,仅能将离子注入目标晶片
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摘要
PURPOSE: A targeting type plasma injector is provided to prevent the excessive injection of an ion by preventing the ion from being injected into a wafer except for a target.;CONSTITUTION: A wafer drive part(120) is included inside a chamber(110). The wafer drive part sequentially drives a loaded wafer(W) to a target location. A plasma generation part(130) is included in one side of the wafer drive part. The plasma generation part generates and transfers plasma into a target wafer. A shielding part(140) shields the remaining area except for the target wafer where an ion is inserted. The shielding part comprises a protrusion member(144) in order to protect the target wafer.;COPYRIGHT KIPO 2011
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