SUBSTRATE CLEANING APPARATUS, WHICH REDUCES THE FREQUENCY OF JOB CHANGE BY POSSESSIVELY DEALING WITH THE CHANGE OF A SUBSTRATE

摘要

PURPOSE: A substrate cleaning apparatus, which reduces the frequency of job change by possessively dealing with the change of a substrate, is provided to reduce a failure rate by removing sticky foreign materials from a substrate.;CONSTITUTION: A substrate cleaning apparatus comprises a substrate transfer part(100), washing and polishing parts(200a,200b) and a unit movable part(100a). The washing and polishing parts are arranged on one or more domain of the substrate transfer part. The washing and polishing part has a polishing disc and a washing disc. The polishing disc removes foreign material from the substrate. The washing disc washes the substrate.;COPYRIGHT KIPO 2011