首页> 外国专利> ELECTROLESS DEPOSITION METHOD OF NANO METALLIC SILVER, AND A SUBSTRATE DEPOSITED WITH NANO METALLIC SILVER THEREBY, WHICH FORM A SILVER SCREEN LAYER

ELECTROLESS DEPOSITION METHOD OF NANO METALLIC SILVER, AND A SUBSTRATE DEPOSITED WITH NANO METALLIC SILVER THEREBY, WHICH FORM A SILVER SCREEN LAYER

机译:纳米金属银的无电沉积方法,以及由此沉积的纳米金属银形成银筛层的基质

摘要

PURPOSE: An electroless deposition method of nano metallic silver, and a substrate deposited with nano metallic silver thereby are provided to form a silver screen layer in which metallic silver of a nano-size is deposited.;CONSTITUTION: An electroless deposition method of nano metallic silver is as follows: Colloidal silver which comprises ionic silver, and reduction solution which comprises a reducing agent for colloidal silver are prepared. The prepared colloidal silver and the reduction solution are sprayed to a certain space separated from a substrate. The temperature of the colloidal silver and the reduction solution is 20°C to 27°C. The spraying angle of the colloidal silver and the reduction solution is 0° to 90°. And the spraying speed of the colloidal silver and the reduction solution is 100ml/min to 300ml/min.;COPYRIGHT KIPO 2010
机译:目的:提供一种纳米金属银的化学沉积方法,并提供一种沉积有纳米金属银的基板,以形成其中沉积有纳米尺寸的金属银的银屏蔽层。;组成:纳米金属的化学沉积方法银如下:制备包含离子银的胶体银和包含用于胶体银的还原剂的还原溶液。将制备的胶体银和还原溶液喷雾到与基材分离的一定空间。胶体银和还原溶液的温度为20℃至27℃。胶体银和还原溶液的喷射角为0度;至90°。胶体银和还原液的喷涂速度为100ml / min至300ml / min。; COPYRIGHT KIPO 2010

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