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ELECTROLESS DEPOSITION METHOD OF NANO METALLIC SILVER, AND A SUBSTRATE DEPOSITED WITH NANO METALLIC SILVER THEREBY, WHICH FORM A SILVER SCREEN LAYER
ELECTROLESS DEPOSITION METHOD OF NANO METALLIC SILVER, AND A SUBSTRATE DEPOSITED WITH NANO METALLIC SILVER THEREBY, WHICH FORM A SILVER SCREEN LAYER
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机译:纳米金属银的无电沉积方法,以及由此沉积的纳米金属银形成银筛层的基质
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摘要
PURPOSE: An electroless deposition method of nano metallic silver, and a substrate deposited with nano metallic silver thereby are provided to form a silver screen layer in which metallic silver of a nano-size is deposited.;CONSTITUTION: An electroless deposition method of nano metallic silver is as follows: Colloidal silver which comprises ionic silver, and reduction solution which comprises a reducing agent for colloidal silver are prepared. The prepared colloidal silver and the reduction solution are sprayed to a certain space separated from a substrate. The temperature of the colloidal silver and the reduction solution is 20°C to 27°C. The spraying angle of the colloidal silver and the reduction solution is 0° to 90°. And the spraying speed of the colloidal silver and the reduction solution is 100ml/min to 300ml/min.;COPYRIGHT KIPO 2010
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