Producing transparent conductive layer, by subjecting substrate e.g. glass to plasma treatment, applying dispersion from transparent conductive oxide nanoparticles on substrate, and partially removing solvent/dispersant from obtained layer

摘要

The method comprises subjecting a substrate such as glass or plastic to a plasma treatment, applying a dispersion from transparent conductive oxide (TCO) nanoparticles on the substrate, partially removing solvent or dispersant from the obtained layer by annealing at 20-200[deg] C for a time period of 1 second to 60 minutes, and subsequently irradiating the obtained layer with a carbon dioxide (CO 2)-laser energy. The dispersion contains indium-tin oxide nanoparticles and is applied on the substrate by inkjet-printings, flexographic printings, pad-printings, spin coating and spraying. The method comprises subjecting a substrate such as glass or plastic to a plasma treatment, applying a dispersion from transparent conductive oxide (TCO) nanoparticles on the substrate, partially removing solvent or dispersant from the obtained layer by annealing at 20-200[deg] C for a time period of 1 second to 60 minutes, and subsequently irradiating the obtained layer with a carbon dioxide (CO 2)-laser energy. The dispersion contains indium-tin oxide nanoparticles and is applied on the substrate by inkjet-printings, flexographic printings, pad-printings, spin coating, spraying, dipping, knife-coating, offset printings, screen printings, thermo-transfer printings, gravure printings, flooding, aerosol jet deposition process or pouring. The obtained layer is irradiated with the CO 2-laser energy with a wavelength of 10.6 mu m and/or with an average output of 1 W to 3 kW and/or a scan line between the next adjacent lines of 0.01-2 mm described by scanning. During scanning, an intersection plane of the focused laser beam is moved with the plane of the obtained layer on the intersection plane with a speed of 50-150000 mm/s. An independent claim is included for a transparent conductive layer.