Projection exposure method, a projection exposure system, laser radiation source and strip widths - a sleeve-like section of the module for a laser radiation source

摘要

In the case of a projection exposure method for the exposure of a in the region of a picture surface of a projection objective arranged, radiation-sensitive substrate with at least one image of a in the region of an object of the projection objective pattern of a mask is arranged with a laser radiation from the angular frequency ω dependent spectral intensity distribution i (ω) is used. The laser radiation is characterized by one hand, however, in accordance with parameters a ration: and a coherence time τ: in accordance with .The laser radiation is generated in an illumination system for generating an illuminating radiation is directed on the mask and the pattern is introduced with the aid of a projection objective imaged onto the substrate. The spectral intensity distribution is adjusted in such a way that, for a lines the form of parameters ατ² the condition ατ² ≦ 0.3 applies. As a result, the influence of temporally varying speckles on the image production compared to conventional processes are reduced, without at the same time the influence of chromatic aberrations to increase on the image generation.