首页> 外国专利> Rack for surface treatment or processing of piezo-stack, has partial racks including frames with holding devices arranged on opposite sides of frames, where holding devices include recesses in frames of partial racks

Rack for surface treatment or processing of piezo-stack, has partial racks including frames with holding devices arranged on opposite sides of frames, where holding devices include recesses in frames of partial racks

机译:用于表面处理或压电叠层的机架,具有部分机架,该部分机架包括具有在机架的相对侧上布置的保持装置的机架,其中,保持装置包括在部分机架的机架中的凹槽

摘要

The rack (1) has partial racks (2, 2') including frames (3, 3') with holding devices arranged on opposite sides of the frames. The holding devices include recesses in the frames of the partial racks, where the recesses have support surfaces arranged to each other. A protection bar (7) is arranged between the holding devices, and is parallel to one of the support surfaces. An electrical element i.e. piezo-stack, has end areas that are inserted in the recesses, where the electrical element has a set of ceramic layers. The recesses are formed in semicircular and/or polygonal shape. An independent claim is also included for a method for sand-blasting of an electrical element.
机译:架子(1)具有包括架子(3、3')的部分架子(2、2'),在架子的相对侧上布置有保持装置。保持装置包括在部分机架的框架中的凹部,其中凹部具有彼此布置的支撑表面。保护杆(7)布置在保持装置之间,并且平行于支撑表面之一。电气元件,即压电叠层,具有插入凹槽中的端部区域,其中电气元件具有一组陶瓷层。凹槽形成为半圆形和/或多边形。还包括一种用于对电气元件进行喷砂的方法的独立权利要求。

著录项

  • 公开/公告号DE102009017231A1

    专利类型

  • 公开/公告日2010-10-14

    原文格式PDF

  • 申请/专利权人 EPCOS AG;

    申请/专利号DE20091017231

  • 发明设计人 THANNER HERBERT J.;

    申请日2009-04-09

  • 分类号B24C3/32;B24C1/00;

  • 国家 DE

  • 入库时间 2022-08-21 18:28:18

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