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Rack for surface treatment or processing of piezo-stack, has partial racks including frames with holding devices arranged on opposite sides of frames, where holding devices include recesses in frames of partial racks
Rack for surface treatment or processing of piezo-stack, has partial racks including frames with holding devices arranged on opposite sides of frames, where holding devices include recesses in frames of partial racks
The rack (1) has partial racks (2, 2') including frames (3, 3') with holding devices arranged on opposite sides of the frames. The holding devices include recesses in the frames of the partial racks, where the recesses have support surfaces arranged to each other. A protection bar (7) is arranged between the holding devices, and is parallel to one of the support surfaces. An electrical element i.e. piezo-stack, has end areas that are inserted in the recesses, where the electrical element has a set of ceramic layers. The recesses are formed in semicircular and/or polygonal shape. An independent claim is also included for a method for sand-blasting of an electrical element.
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