quality, etc. and method for dosing hochviskoser liquids

摘要

Multilayer - mirror for euv - radiation, the one disposed on a substrate layer sequence (7) from a multiplicity of layer pairs (5) in each case from a first layer (1) is made of a first material and is applied a second layer (2) is made of a second material, wherein the first layers (1) and said second layers (2) each have a thickness of more than 2 nm, andthat the first material or the second material is a silicon nitride, a molybdenum nitride or a molybdenum boride is,and wherein a heating device (17) is provided in order to the multilayer - mirror (19) to an operating temperature of 300°C or more heating.