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DEFECT CORRECTION DEVICE, DEFECT TRACKING METHOD, AND DEFECT TRACKING PROGRAM

机译:缺陷校正设备,缺陷跟踪方法和缺陷跟踪程序

摘要

PROBLEM TO BE SOLVED: To repair a defect, while suppressing increase of the number of processes and redundancy of a working time.SOLUTION: This defect correction device 100 including a microscope part 110 for acquiring an image in which a part of a workpiece W 10 is enlarged, and a laser repair head 120 for irradiating the workpiece W 10 with laser light spatially modulated for defect repair based on an image acquired by the microscope part 110, also includes a control part 101 for determining whether a defect D included in the image acquired by the microscope part 110 is extended to the outside of the image, tracking the defect so that a part extended to the outside of the image is drawn into a visual filed region R1 of the microscope part 110, when the defect D is extended to the outside of the image, and setting one or more shot regions to the defect D included in the image acquired by the microscope part 110. The control part 101 sets one or more shot regions to the defect D included in the image acquired by the microscope part 110 after tracking.
机译:解决的问题:在抑制缺陷的同时,抑制工艺数量的增加和工作时间的冗余。解决方案:该缺陷校正装置100包括用于获取图像的显微镜部110,该显微镜部110获取工件W 10的一部分的图像。放大图像,并且激光修复头120用于基于显微镜部分110获取的图像向空间被调制的激光W照射工件W 10以进行缺陷修复,还包括控制部分101,该控制部分101用于确定图像中是否包括缺陷D。由显微镜部件110获取的图像扩展到图像的外部,跟踪缺陷,使得当缺陷D扩展到图像D时,扩展到图像外部的部分被绘制到显微镜部件110的可视区域R1中。图像的外部,并且将一个或多个拍摄区域设置到由显微镜部件110获取的图像中包括的缺陷D。控制部101将一个或多个拍摄区域设置到包括缺陷的D上跟踪之后,在由显微镜部分110获取的图像中记录下图像。

著录项

  • 公开/公告号JP2011203710A

    专利类型

  • 公开/公告日2011-10-13

    原文格式PDF

  • 申请/专利权人 OLYMPUS CORP;

    申请/专利号JP20100231020

  • 发明设计人 YAMAZAKI RYUICHI;

    申请日2010-10-13

  • 分类号G09F9;B23K26/02;B23K26;B23K26/03;G02F1/13;

  • 国家 JP

  • 入库时间 2022-08-21 18:25:50

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