PRECURSOR OF ACID-DISSOCIATIVE DISSOLUTION-INHIBITING GROUP, AND CYCLIC COMPOUND HAVING ACID-DISSOCIATIVE DISSOLUTION-INHIBITING GROUP

摘要

PROBLEM TO BE SOLVED: To provide a photoresist base material and a photoresist composition, having excellent coating solvent dissolvability, high transparency, high sensitivity, high microfabrication properties, high strength, and low outgas properties, and to provide a precursor of an acid-dissociative dissolution-inhibiting group constituting a part of a photoresist base material.;SOLUTION: The photoresist composition includes a compound represented by formula (1) (wherein, R is a group having a benzenecarboxylic acid ester site and an aliphatic condensed ring site; R¹ is a group such as hydroxy and alkoxy; and R² is hydrogen).;COPYRIGHT: (C)2011,JPO&INPIT