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REACTION SUBSTRATE PRODUCTION METHOD AND REACTION SUBSTRATE PRODUCTION DEVICE

机译:反应基质的生产方法及反应基质的生产装置

摘要

PROBLEM TO BE SOLVED: To perform a stable measurement in a short time.;SOLUTION: The reaction substrate production method comprises cooling the reaction substrate 1 having wells 10 below a solidification temperature, and then injecting a liquid containing a reagent into the wells 10 of the reaction substrate 1 from a reagent injection portion 25 to produce the reaction substrate 1 on which the reagent is solidified. Since the liquid containing the reagent is adhered to the wells 10 in a frozen state, the liquid can be solidified in a stable state without being contaminated with impurities causing noises and without drying the reagent, and further since the reagent is preliminarily solidified to the wells 10, the measurement can be started only by injecting a specimen solution. Thus, the stable measurement can be performed in a short time.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:为了在短时间内进行稳定的测量;解决方案:反应基质的生产方法包括将具有孔10的反应基质1冷却至低于凝固温度,然后将包含试剂的液体注入到溶液的孔10中。从试剂注入部分25反应的反应基板1,以产生在其上固化试剂的反应基板1。由于包含试剂的液体以冷冻状态附着在孔10上,因此可以稳定地固化而不会被产生噪音的杂质污染并且不使试剂干燥,并且由于试剂被预先固化到孔中如图10所示,仅可以通过注入样品溶液来开始测量。因此,可以在短时间内进行稳定的测量。;版权所有:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2011139641A

    专利类型

  • 公开/公告日2011-07-21

    原文格式PDF

  • 申请/专利权人 SONY CORP;

    申请/专利号JP20100000761

  • 发明设计人 OTO YASUNORI;

    申请日2010-01-05

  • 分类号C12N15/09;G01N37/00;G01N35/02;

  • 国家 JP

  • 入库时间 2022-08-21 18:25:23

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