首页> 外国专利> METHOD FOR PRODUCING APPARATUS FOR CITY WATER MADE OF LEAD-CONTAINING COPPER ALLOY, AND TREATMENT METHOD THEREFOR

METHOD FOR PRODUCING APPARATUS FOR CITY WATER MADE OF LEAD-CONTAINING COPPER ALLOY, AND TREATMENT METHOD THEREFOR

机译:含铅铜合金城市供水设备的生产方法及处理方法

摘要

PROBLEM TO BE SOLVED: To provide an achievable method regarding both of lead and nickel in the reduction of the elution amounts to water from the inner circumferential face of a water passage in an apparatus for city water.SOLUTION: The production method is provided with: a plating step S10; a first treatment step S11; a second treatment stage S12; a third treatment step S13; and a fourth treatment step S14. In the first treatment step S11, a mixed acid aqueous solution of nitric acid and hydrochloric acid is prepared as a first treatment solution, and a first workpiece W1 after being subjected to the plating step S10 is dipped into the first treatment solution so as to obtain a second workpiece W2. In the second treatment step S12, a BTA aqueous solution is prepared as a second treatment solution, and the second workpiece W2 is dipped into the second treatment solution so as to obtain a third workpiece W3. In the third treatment step S13, a sodium hydroxide aqueous solution is prepared as a third treatment solution, and the third workpiece W3 is dipped into the third treatment solution so as to obtain a fourth workpiece W4. In the fourth treatment step S14, a phosphoric acid aqueous solution is prepared as a fourth treatment solution, and the fourth workpiece W4 is dipped into the fourth treatment solution.
机译:解决的问题:提供一种关于铅和镍的可实现的方法,以减少城市用水设备中水通道内周面的水洗脱量。解决方案:该生产方法包括:电镀步骤S10;第一处理步骤S11;第二处理阶段S12;第三处理步骤S13;第四处理步骤S14。在第一处理步骤S11中,准备硝酸和盐酸的混合酸水溶液作为第一处理溶液,将进行了镀敷步骤S10后的第一工件W1浸渍在第一处理溶液中,得到。第二工件W2。在第二处理步骤S12中,准备BTA水溶液作为第二处理溶液,并且将第二工件W2浸入第二处理溶液中以获得第三工件W3。在第三处理步骤S13中,准备氢氧化钠水溶液作为第三处理溶液,并且将第三工件W3浸入第三处理溶液中以获得第四工件W4。在第四处理步骤S14中,准备磷酸水溶液作为第四处理溶液,并将第四工件W4浸入第四处理溶液中。

著录项

  • 公开/公告号JP2011012342A

    专利类型

  • 公开/公告日2011-01-20

    原文格式PDF

  • 申请/专利权人 INAX CORP;

    申请/专利号JP20100121980

  • 申请日2010-05-27

  • 分类号C23C28/00;C23C22/08;C23F1/00;C25D5/48;

  • 国家 JP

  • 入库时间 2022-08-21 18:24:31

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