首页> 外国专利> WAVELENGTH SELECTIVE DIFFRACTION GRATING, MANUFACTURING METHOD OF WAVELENGTH SELECTIVE DIFFRACTION GRATING, AND OPTICAL APPARATUS

WAVELENGTH SELECTIVE DIFFRACTION GRATING, MANUFACTURING METHOD OF WAVELENGTH SELECTIVE DIFFRACTION GRATING, AND OPTICAL APPARATUS

机译:波长选择性衍射光栅,波长选择性衍射光栅的制造方法和光学仪器

摘要

PROBLEM TO BE SOLVED: To provide a wavelength selective diffraction grating which copes with shortening of a wavelength and miniaturization of the grating, and does not require high precision processing in the fabrication of the grating, to provide a manufacturing method of the wavelength selective diffraction grating, and to provide an optical apparatus.;SOLUTION: The wavelength selective diffraction grating 4A includes a transparent substrate 11 and wavelength selective holograms 12 and 13 laminated in order. The wavelength selective hologram 12 diffracts a light beam of a first wavelength. The wavelength selective hologram 13 diffracts a light beam of a second wavelength. The wavelength selective holograms 12 and 13 are manufactured by volume holograms, and a photopolymer is used as a photosensitive material. The photopolymer for the volume holograms mainly comprises a matrix polymer having a first refractive index, a monomer having a second refractive index, a photoreaction initiator, and other additives.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:提供一种波长选择衍射光栅,其能够应对波长的缩短和光栅的小型化,并且在光栅的制造中不需要高精度的加工,从而提供一种波长选择衍射光栅的制造方法。解决方案:波长选择衍射光栅4A包括透明基板11和依次层叠的波长选择全息图12和13。波长选择全息图12衍射第一波长的光束。波长选择全息图13衍射第二波长的光束。波长选择全息图12和13由体积全息图制造,并且光敏聚合物用作感光材料。体积全息图的光敏聚合物主要包括具有第一折射率的基体聚合物,具有第二折射率的单体,光反应引发剂和其他添加剂。版权所有:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP2011227951A

    专利类型

  • 公开/公告日2011-11-10

    原文格式PDF

  • 申请/专利权人 SHARP CORP;

    申请/专利号JP20100094932

  • 发明设计人 NAGASAKA YUKIKO;

    申请日2010-04-16

  • 分类号G11B7/135;G11B7/22;

  • 国家 JP

  • 入库时间 2022-08-21 18:24:21

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