首页> 外国专利> DEVICE AND METHOD FOR MONITORING STATIC ELIMINATOR, AND MONITORING PROGRAM FOR STATIC ELIMINATOR

DEVICE AND METHOD FOR MONITORING STATIC ELIMINATOR, AND MONITORING PROGRAM FOR STATIC ELIMINATOR

机译:监测静电消除器的装置和方法,以及监测静电消除器的程序

摘要

PROBLEM TO BE SOLVED: To provide a device for monitoring a static eliminator that allows execution of a highly reliable electrical characteristic inspection by monitoring the static eliminator for eliminating static electricity, charged in a workpiece, when executing an electrical characteristic inspection of a semiconductor wafer W.;SOLUTION: The monitoring device (monitoring circuit) 22 for the static eliminator monitors the static eliminator 20 that eliminates static electricity, charged in the semiconductor wafer W from a main chuck 14, by using a discharge switch circuit 21A when executing an electric-characteristic inspection of the semiconductor wafer W by bringing the semiconductor wafer W on the main chuck 14 into contact with a probe card 15 by the relative movement of the main chuck 14 and the probe card. The device includes: a detection switch circuit 22A that is linked with the discharge switch circuit 21A of the static eliminator 20 and detects a malfunction of the discharge switch circuit 21A; a detection drive circuit 22B for opening and closing the detection switch circuit 22A; and a decision circuit 22C for determining a malfunction of the discharge switch circuit 21A via the detection switch circuit 22A.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种用于监视静电消除器的装置,该装置通过在执行半导体晶片W的电气特性检查时监视静电消除器以消除工件中带电的静电,从而执行高度可靠的电气特性检查。解决方案:静电消除器的监视装置(监视电路)22监视静电消除器20,该静电消除器20在执行电气操作时通过使用放电开关电路21A来消除从主卡盘14充入半导体晶片W中的静电。通过主卡盘14和探针卡的相对运动,使主卡盘14上的半导体晶片W与探针卡15接触,从而对半导体晶片W进行特性检查。该装置包括:检测开关电路22A,其与静电消除器20的放电开关电路21A链接,并且检测放电开关电路21A的故障。检测驱动电路22B用于断开和闭合检测开关电路22A;判定电路22C,用于经由检测用开关电路22A判定放电用开关电路21A的异常。版权:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2011054762A

    专利类型

  • 公开/公告日2011-03-17

    原文格式PDF

  • 申请/专利权人 TOKYO ELECTRON LTD;

    申请/专利号JP20090202431

  • 发明设计人 SHINOHARA EIICHI;

    申请日2009-09-02

  • 分类号H01L21/66;G01R31/28;

  • 国家 JP

  • 入库时间 2022-08-21 18:23:54

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号