首页> 外国专利> WAVELENGTH VARIABLE INTERFERENCE FILTER, COLORIMETRIC SENSOR, COLORIMETRIC MODULE, AND METHOD OF MANUFACTURING THE WAVELENGTH VARIABLE INTERFERENCE FILTER

WAVELENGTH VARIABLE INTERFERENCE FILTER, COLORIMETRIC SENSOR, COLORIMETRIC MODULE, AND METHOD OF MANUFACTURING THE WAVELENGTH VARIABLE INTERFERENCE FILTER

机译:波长可变干扰滤波器,比色传感器,比色模块以及制造波长可变干扰滤波器的方法

摘要

PROBLEM TO BE SOLVED: To provide a wavelength variable interference filter having a large spectral wavelength region and high transmittance and resolution of dispersed light, a colorimetric sensor, and a colorimetric module.;SOLUTION: An etalon includes a pair of mirrors 56 and 57 facing each other and an electrostatic actuator for varying the gap between mirrors which is the interval between these mirrors. Each of the pair of mirrors 56 and 57 includes a plurality of dielectric films 551, and post members 552 that are disposed between these dielectric films 551, keeps the distance between the dielectric films 551 facing each other at a predetermined dimension, and forms an air layer 553 between the dielectric films 551 facing each other.;COPYRIGHT: (C)2011,JPO&INPIT
机译:要解决的问题:提供一种波长可变干涉滤光片,一个比色传感器和一个比色模块,该滤光片具有大的光谱波长区域和高的透射率并能分辨色散的光;解决方案:标准具包括一对面向侧面的反射镜56和57静电致动器用于改变镜之间的间隙,该间隙是这些镜之间的间隔。一对反射镜56和57中的每一个包括多个电介质膜551,以及设置在这些电介质膜551之间的支柱构件552,将彼此面对的电介质膜551之间的距离保持在预定尺寸,并形成空气。介电膜551之间彼此相对的层553.COPYRIGHT:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2011191474A

    专利类型

  • 公开/公告日2011-09-29

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20100057127

  • 发明设计人 FUNASAKA TSUKASA;

    申请日2010-03-15

  • 分类号G02B26/00;G02B5/28;B81B3/00;B81C1/00;G01J3/26;

  • 国家 JP

  • 入库时间 2022-08-21 18:23:37

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号