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CHARGED PARTICLE BEAM PLOTTING DEVICE, CHARGED PARTICLE BEAM PLOTTING METHOD, AND VIBRATION COMPONENT EXTRACTING METHOD

机译:带电粒子束标绘装置,带电粒子束标绘方法和振动成分提取方法

摘要

PROBLEM TO BE SOLVED: To provide a charged particle beam plotting device and a charged particle beam plotting method obtaining high plotting position accuracy by accurately measuring a stage position.;SOLUTION: A position signal by a first stage position measuring means is obtained in S101, and a frequency analysis of this signal is made in S103. A position signal by a second stage position measuring means is obtained in S102, and a frequency analysis of this signal is made in S104. In S105, the results of S103 and S104 are compared to specify a vibration component derived from the first position measuring means. In S106, a signal of reverse phase to the vibration component predetermined in S105 is generated. In S107, the signal generated in S105 is added to the position signal obtained in S101. A correction signal is transmitted to a servo control section and a deflection control section to control a stage position and an electron beam position.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种带电粒子束标绘装置和带电粒子束标绘方法,其通过精确地测量载物台位置来获得较高的标绘位置精度。解决方案:在S101中,通过第一载物台位置测量装置获得位置信号,在S103中对该信号进行频率分析。在S102中获得第二级位置测量装置的位置信号,并且在S104中对该信号进行频率分析。在S105中,比较S103和S104的结果以指定从第一位置测量装置导出的振动分量。在S106中,生成与在S105中预定的振动分量反相的信号。在S107中,将在S105中生成的信号与在S101中获得的位置信号相加。校正信号被传送到伺服控制部分和偏转控制部分,以控制镜台位置和电子束位置。;版权:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2011040614A

    专利类型

  • 公开/公告日2011-02-24

    原文格式PDF

  • 申请/专利权人 NUFLARE TECHNOLOGY INC;

    申请/专利号JP20090187366

  • 发明设计人 TOYA TAKANAO;

    申请日2009-08-12

  • 分类号H01L21/027;G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-21 18:23:32

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