首页>
外国专利>
ION IMPLANTATION DEVICE EQUIPPED WITH TWO OR MORE UNIFORMIZING LENSES, AND SELECTING METHOD OF TWO OR MORE UNIFORMIZING LENSES
ION IMPLANTATION DEVICE EQUIPPED WITH TWO OR MORE UNIFORMIZING LENSES, AND SELECTING METHOD OF TWO OR MORE UNIFORMIZING LENSES
展开▼
机译:配备两个或更多个均一化透镜的离子注入装置以及两个或更多个均一化透镜的选择方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To irradiate an ion beam having sufficiently uniform current density distribution against a semiconductor substrate even when energy reduction of the ion beam is advanced.;SOLUTION: This ion injection device includes: an accelerating and decelerating device to accelerate or decelerate a ribbon-shaped ion beam in order to irradiate the ribbon-shaped ion beam having a desired energy onto the semiconductor substrate; a first uniformizing lens and a second uniformizing lens in order to uniformly control the electric current density distribution in the longitudinal direction of the ribbon-shaped ion beam; a treatment room in which the semiconductor substrate is arranged; and a beam current meter which is arranged in the treatment room and carries out measurement of the current density distribution in the longitudinal side direction of the ribbon-shaped ion beam. Then, when a route of the ribbon-shaped ion beam is seen from a treatment room side, the second uniformizing lens, the accelerating and decelerating device, and the first uniformizing lens are arranged in this order along the route of the ion beam.;COPYRIGHT: (C)2011,JPO&INPIT
展开▼