RESIST SOLUTION SUPPLY APPARATUS, RESIST SOLUTION SUPPLY METHOD, PROGRAM, AND COMPUTER STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To reduce a foreign matter in a resist solution supplied on a substrate, and to reduce a defect in a resist pattern.;SOLUTION: This resist solution supply apparatus 200 includes a resist solution supply source 201 for reserving the resist solution. The resist solution supply source 201 is connected to an application nozzle 142 via a supply pipe 202. A heater 205 for heating the resist solution in the supply pipe 202 is provided in a downstream of the resist solution supply source 201. The heater 205 can heat the resist solution to 23°C-50°C. A filter 207 for removing the foreign matter in the resist solution is provided in a downstream of the heater 205. A temperature regulation pipe 211 for cooling the resist solution in the supply pipe 202 is provided in a downstream of the filter 207. The temperature regulation pipe 211 can cool the resist solution to 23°C.;COPYRIGHT: (C)2011,JPO&INPIT