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Method and apparatus for pulsed plasma processing using a time-resolved tuning scheme for the RF power supply
Method and apparatus for pulsed plasma processing using a time-resolved tuning scheme for the RF power supply
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机译:使用时间分辨调谐方案对RF电源进行脉冲等离子体处理的方法和设备
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摘要
Embodiments of the present invention generally provide methods and apparatus for pulsed plasma processing over a wide process window. In some embodiments, an apparatus may include an RF power supply having frequency tuning and a matching network coupled to the RF power supply that share a common sensor for reading reflected RF power reflected back to the RF power supply. In some embodiments, an apparatus may include an RF power supply having frequency tuning and a matching network coupled to the RF power supply that share a common sensor for reading reflected RF power reflected back to the RF power supply and a common controller for tuning each of the RF power supply and the matching network.
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