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METHOD AND APPARATUS FOR MANUFACTURING GAS-DISSOLVED WATER

机译:用于制造溶解气体的水的方法和装置

摘要

PROBLEM TO BE SOLVED: To provide a gas-dissolved water manufacturing apparatus capable of preventing flowing in and the like into a gas flow control device by removing condensed water generated in a gas supplying piping after a long term stopping.;SOLUTION: When ultrapure water flows into an electrolytic device 3, hydrogen gas is generated by an electrolysis of water. This hydrogen gas is lead toward a gas dissolving membrane module 2 via a dehumidifying membrane 9, a gas filter 11 and an MFC 10. This hydrogen gas flows into a gas phase chamber 2c, goes into a liquid phase chamber 2b by passing a gas permeating membrane 2a, dissolves into ultrapure water here and hydrogen-dissolved water is obtained. When the gas-dissolved water manufacturing apparatus is stopped for a long time, condensed water is stored in the gas supplying piping 8 between the electrolytic device 3 and the dehumidifying membrane 9; therefore, the condensed water moves inside the gas supplying piping 8 toward the gas dissolving membrane module 2 when the gas-dissolved water manufacturing device is started up again. However, as the condensed water is removed by the gas filter 11, it does not reach the MFC 10 gas flow control device.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种气体溶解水制造设备,该设备能够通过长期停止后去除气体供应管道中产生的冷凝水来防止流入气体流量控制装置等。解决方案:超纯水时如果流入电解装置3,则水的电解产生氢气。该氢气经由除湿膜9,气体过滤器11和MFC 10被引向气体溶解膜组件2。该氢气流入气相室2c,通过使气体透过而进入液相室2b。膜2a在这里溶解成超纯水,得到氢溶解的水。当气体溶解水制造装置长时间停止时,冷凝水被存储在电解装置3与除湿膜9之间的气体供应管道8中;因此,当气体溶解水制造装置再次启动时,冷凝水在气体供应管道8内朝着气体溶解膜组件2移动。但是,由于冷凝水已通过气体过滤器11除去,因此无法到达MFC 10气体流量控制装置。版权所有:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2011083754A

    专利类型

  • 公开/公告日2011-04-28

    原文格式PDF

  • 申请/专利权人 KURITA WATER IND LTD;

    申请/专利号JP20090240801

  • 申请日2009-10-19

  • 分类号B01F5/06;B01F1/00;B01F15/02;C02F1/68;B01F3/04;C25B9/00;

  • 国家 JP

  • 入库时间 2022-08-21 18:21:16

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