Rinse treatment manner and development treatment manner, the development central processing unit, forming the developer paddle on the resist

摘要

PROBLEM TO BE SOLVED: To provide a rinsing method capable of reducing development faults due to development residues irrespective of a surface state of a resist.;SOLUTION: The rinsing method for rinsing a substrate after an exposure pattern is developed comprises a process (step 5) wherein the substrate, on which a development solution paddle is existent after the development was finished, is made to be a stopped state or a rotated state, and a rinse solution is supplied to the center of the substrate; a process (step 6) wherein the supply of the rinse solution is stopped, in the state where the development solution paddle remains at least at an outside portion on the substrate; and a process (step 7) wherein the development solution on the substrate is shaken off together with the rinse solution by rotating the substrate at a high speed.;COPYRIGHT: (C)2007,JPO&INPIT