首页> 外国专利> The light guide plate and surface light equipment, from the illuminant panel and the Liquid Crystal Display for liquid crystal display and the production mannered null

The light guide plate and surface light equipment, from the illuminant panel and the Liquid Crystal Display for liquid crystal display and the production mannered null

机译:导光板和面光设备,由发光面板和液晶显示器组成,用于液晶显示器及其生产方式

摘要

PPROBLEM TO BE SOLVED: To provide a structure of a light guide plate and its manufacturing method capable of improving the luminance of emitted light. PSOLUTION: In the light guide plate 1, light is incident on an incident part from a light source; and the incident light is propagated internally and emitted from an emission surface. The emitted light illuminates a display screen. On the opposite surface to the emission surface, a plurality of minutely formed parts 10 are formed and dotted into concave shapes; and the diameter dimension defining the size of the minutely formed parts is smaller than an interval of pixels constituting a display screen. The light guide plate is manufactured by forming a synthetic resin material by fabricating a resist structure, having a top wall surface and sidewall surfaces inclined against the top wall surface, in an intermediate step of the manufacturing process. The resist structure is formed, by forming exposed parts and unexposed parts by irradiating a resist film on a substrate with X-rays or ultraviolet rays, and developing the exposed resist film. By controlling the energy intensity distribution of the X-rays or ultraviolet rays, the inclined surfaces are formed as boundaries of irradiated regions and non-irradiated regions. PCOPYRIGHT: (C)2009,JPO&INPIT
机译:

要解决的问题:提供一种导光板的结构及其制造方法,其能够提高发射光的亮度。

解决方案:在导光板1中,光从光源入射到入射部分;入射光在内部传播并从发射表面发射。发出的光照亮显示屏。在与射出面相反的一侧的面上,形成有多个微细地形成的部分10,并散布成凹状。限定微小形成部分的尺寸的直径尺寸小于构成显示屏的像素的间隔。在制造过程的中间步骤中,通过制造抗蚀剂结构来形成合成树脂材料,从而形成导光板,该抗蚀剂结构具有顶壁表面和相对于顶壁表面倾斜的侧壁表面。通过用X射线或紫外线照射基板上的抗蚀剂膜并形成曝光部分和未曝光部分,并对曝光后的抗蚀剂膜进行显影,从而形成抗蚀剂结构。通过控制X射线或紫外线的能量强度分布,将倾斜面形成为照射区域和非照射区域的边界。

版权:(C)2009,日本特许厅&INPIT

著录项

  • 公开/公告号JP4634486B2

    专利类型

  • 公开/公告日2011-02-23

    原文格式PDF

  • 申请/专利权人

    申请/专利号JP20080122790

  • 发明设计人

    申请日2008-05-08

  • 分类号F21S2/00;F21Y103/00;G02B6/00;G02F1/13357;

  • 国家 JP

  • 入库时间 2022-08-21 18:19:36

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