首页> 外国专利> UV nanoimprint method, and a method of manufacturing the resin replica mold, and a method of manufacturing the magnetic recording medium, and magnetic recording and reproducing apparatus

UV nanoimprint method, and a method of manufacturing the resin replica mold, and a method of manufacturing the magnetic recording medium, and magnetic recording and reproducing apparatus

机译:UV纳米压印方法,树脂复制品模具的制造方法,磁记录介质的制造方法,磁记录再生装置

摘要

The present invention, an ultraviolet light after the work of forming a thin film made of a UV curable resin on a substrate, and compression molding is pressed against a mold having a pattern formed on the surface, simultaneously with the compression molding or with the compression molding A UV nanoimprint method of transferring the pattern on the thin film by irradiation, irradiated with ultraviolet light irradiation apparatus equipped with temperature rise suppression means, a light source of the ultraviolet light irradiation device, the ultraviolet light, ultraviolet light same time providing a UV nanoimprint method which is characterized by using a light source that heat rays are not emitted continuously.
机译:本发明,在压缩成型的同时或在压缩的同时,将紫外线固化树脂制成的薄膜在基板上形成并压制成型后,将紫外线压在表面上形成有图案的模具上。模制的紫外线纳米压印方法,该方法通过辐照在薄膜上转印图案,并用装有温升抑制装置的紫外线辐照设备辐照,该紫外线辐照设备的光源,紫外线,同时提供紫外线的紫外线纳米压印法,其特征在于使用不连续发射热射线的光源。

著录项

  • 公开/公告号JPWO2009110596A1

    专利类型

  • 公开/公告日2011-07-14

    原文格式PDF

  • 申请/专利权人 昭和電工株式会社;

    申请/专利号JP20100501977

  • 发明设计人 内田 博;坂田 優子;福島 正人;

    申请日2009-03-06

  • 分类号H01L21/027;B29C59/02;B29C33/38;G11B5/855;

  • 国家 JP

  • 入库时间 2022-08-21 18:17:40

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号