PROBLEM TO BE SOLVED: To provide a drying device of saved power and space for drying substrates, with no residue after drying, requiring no cooling process after drying.;SOLUTION: A first reactor A is provided on the upper stream side in transportation direction of a processed substrate W, with a second reactor B provided on its lower stream side. The reactors A and B comprise a surface processing device which supplies the processed substrate W with reactive gas made into plasma. The first reactor A is supplied with such reactive gas as modifying the surface of the processed substrate W when made into plasma, and the second reactor B is supplied with such reactive gas as containing components for dissociating water molecule and organics when made into plasma. Thus, in the first reactor A, the water content sticking to the surface of processed substrate W is modified to weaken the surface tension force of water drops, and in the second reactor B, the water molecule in the surface of water drop is dissociated, and organics are decomposed for drying substrates.;COPYRIGHT: (C)2007,JPO&INPIT
展开▼
