Production method of the deposition source substrate thin film forming method, vapor deposition and source substrate,

摘要

PROBLEM TO BE SOLVED: To provide a thin film depositing method capable of depositing a thin film on a substrate with a simple configuration.;SOLUTION: In the thin film depositing method, a thin film 12 is deposited on a thin film deposition surface 11 by vapor-depositing a film material 23 on the thin film deposition surface 11 of a substrate 10 to be vapor-deposited. The thin film deposition surface 11 of the substrate 10 and a material feed surface 21 of a feed substrate 20 with the film material 23 carried by the material feed surface 21 are arranged close to and facing each other. A recess 22 of a mirror image pattern of a desired pattern is formed in the material feed surface 21, and the film material 23 is arranged in the recess 22. A substantially closed space is formed between the recess 22 and the thin film deposition surface 11. When the film material 23 in the recess 22 is evaporated, vapor of the film material 23 is transported to each facing area on the thin film deposition surface 11 facing the film material 23. Thus the thin film 12 is vapor-deposited on the thin film deposition surface 11.;COPYRIGHT: (C)2006,JPO&NCIPI