RETARGET PROCESS MODELING METHOD, METHOD OF FABRICATING MASK USING THE RETARGET PROCESS MODELING METHOD, COMPUTER READABLE STORAGE MEDIUM, AND IMAGING SYSTEM

摘要

In a retarget process modeling method, an effect according to density of patterns, and shapes or distances with respect to neighboring patterns may be sufficiently reflected while a relatively small amount of time and few costs are consumed. The retarget process modeling method involves obtaining prediction data, by a modelling calculating unit, on a test layout using a first process model, obtaining bias data based on measurement data of the test layout and the prediction data, using the bias data to check and detect corresponding features of a representative pattern affected by a photoresist (PR) flow rate, generating kernels including a PR flow kernel in consideration of a sub resolution assist feature (SRAF) pattern of the representative pattern to determine an uncalibrated model including the kernels and obtaining a second process model by fitting the uncalibrated model to the measurement data to obtain a second process model.