首页> 外国专利> PHOTOELASTIC METHOD FOR ABSOLUTE DETERMINATION OF ZERO CTE CROSSOVER IN LOW EXPANSION SILICA-TITANIA GLASS SAMPLES

PHOTOELASTIC METHOD FOR ABSOLUTE DETERMINATION OF ZERO CTE CROSSOVER IN LOW EXPANSION SILICA-TITANIA GLASS SAMPLES

机译:光弹法绝对测定低膨胀二氧化硅-二氧化钛玻璃样品中的零CTE穿越

摘要

The disclosure is directed to a photoelastic method for measuring the absolute Tzc of a sample of materials (transparent glass, glass-ceramic or ceramic) directly, without requiring calibration against a primary technique. The method involves subjecting the sample to a temperature gradient that generates a stress distribution pattern within the sample. When some portion of the sample is at a temperature equal to the Tzc of the material, the pattern adopts an easily identifiable shape whose measurement allows the calculation of Tzc. Silica-titania glass, which has a low thermal expansion, is used as an exemplary material.
机译:本发明涉及一种直接用于测量材料(透明玻璃,玻璃陶瓷或陶瓷)样品的绝对Tzc的光弹性方法,而无需针对主要技术进行校准。该方法涉及使样品经受温度梯度,该温度梯度在样品内产生应力分布图案。当样品的某个部分处于等于材料的Tzc的温度时,图案采用易于识别的形状,其形状可以测量Tzc。具有低热膨胀的二氧化硅-二氧化钛玻璃用作示例性材料。

著录项

  • 公开/公告号US2011043787A1

    专利类型

  • 公开/公告日2011-02-24

    原文格式PDF

  • 申请/专利权人 CARLOS DURAN;

    申请/专利号US20100856728

  • 发明设计人 CARLOS DURAN;

    申请日2010-08-16

  • 分类号G01B11/16;

  • 国家 US

  • 入库时间 2022-08-21 18:13:43

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