首页>
外国专利>
METHOD FOR DEPOSITING AN AMORPHOUS SILICON FILM FOR PHOTOVOLTAIC DEVICES WITH REDUCED LIGHT-INDUCED DEGRADATION FOR IMPROVED STABILIZED PERFORMANCE
METHOD FOR DEPOSITING AN AMORPHOUS SILICON FILM FOR PHOTOVOLTAIC DEVICES WITH REDUCED LIGHT-INDUCED DEGRADATION FOR IMPROVED STABILIZED PERFORMANCE
展开▼
机译:减少光致降解的光电器件中非晶硅膜的沉积方法,以提高稳定的性能
展开▼
页面导航
摘要
著录项
相似文献
摘要
A thin film photovoltaic device on a substrate is being realized by a method for manufacturing a p-i-n junction semiconductor layer stack with a p-type microcrystalline silicon layer, a p-type amorphous silicon layer, a buffer silicon layer comprising preferably intrinsic amorphous silicon, an intrinsic type amorphous silicon layer, and an n-type silicon layer over the intrinsic type amorphous silicon layer.
展开▼