首页> 外国专利> PROCESS FOR PRODUCING SURFACE EMITTING LASER, PROCESS FOR PRODUCING SURFACE EMITTING LASER ARRAY, AND OPTICAL APPARATUS INCLUDING SURFACE EMITTING LASER ARRAY PRODUCED BY THE PROCESS

PROCESS FOR PRODUCING SURFACE EMITTING LASER, PROCESS FOR PRODUCING SURFACE EMITTING LASER ARRAY, AND OPTICAL APPARATUS INCLUDING SURFACE EMITTING LASER ARRAY PRODUCED BY THE PROCESS

机译:产生表面发射激光的过程,产生表面发射激光的阵列的过程以及包括该过程产生的包括表面发射激光的阵列的光学装置

摘要

Provided is a process for producing a surface emitting laser including a surface relief structure provided on laminated semiconductor layers, including the steps of transferring, to a first dielectric film, a first pattern for defining a mesa structure and a second pattern for defining the surface relief structure in the same process; and forming a second dielectric film on the first dielectric film and a surface of the laminated semiconductor layers to which the first pattern and the second pattern have been transferred. Accordingly, a center position of the surface relief structure can be aligned with a center position of a current confinement structure at high precision.
机译:提供一种用于制造包括设置在层叠的半导体层上的表面起伏结构的表面发射激光器的方法,该方法包括将用于限定台面结构的第一图案和用于限定表面起伏的第二图案转移到第一介电膜的步骤。在同一过程中构造;在第一介电膜和层叠了第一图案和第二图案的层叠半导体层的表面上形成第二介电膜。因此,表面起伏结构的中心位置可以高精度地与电流限制结构的中心位置对准。

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