首页> 外国专利> THIN FILM TRANSISTOR ARRAY SUBSTRATE FOR A DISPLAY PANEL AND A METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR ARRAY SUBSTRATE FOR A DISPLAY PANEL

THIN FILM TRANSISTOR ARRAY SUBSTRATE FOR A DISPLAY PANEL AND A METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR ARRAY SUBSTRATE FOR A DISPLAY PANEL

机译:用于显示面板的薄膜晶体管阵列基板以及一种制造用于显示面板的薄膜晶体管阵列基板的方法

摘要

A method of manufacturing a thin film transistor capable of simplifying a substrate structure and a manufacturing process is disclosed. The method of manufacturing a thin film transistor array substrate comprising a three mask process. The 3 mask process comprising, forming a gate pattern on a substrate, forming a gate insulating film on the substrate, forming a source/drain pattern and a semiconductor pattern on the substrate, forming a first, second, and third passivation film successively on the substrate. Over the above multi-layers of the passivation film forming a first photoresist pattern comprising a first portion formed on part of the drain electrode and on the pixel region, and a second portion wherein, the second portion thicker than the first portion, and then patterning the third passivation film using the first photoresist pattern, forming a second photoresist pattern by removing the first portion of the first photoresist pattern, forming a transparent electrode film on the substrate, removing the second photoresist pattern and the transparent electrode film disposed on the second photoresist pattern; and forming a transparent electrode pattern on the second passivation layer.
机译:公开了一种能够简化基板结构的薄膜晶体管的制造方法和制造工艺。包括三个掩模工艺的制造薄膜晶体管阵列基板的方法。 3掩膜工艺包括:在衬底上形成栅极图案;在衬底上形成栅极绝缘膜;在衬底上形成源/漏图案和半导体图案;在该衬底上依次形成第一,第二和第三钝化膜。基质。在钝化膜的上述多层上形成第一光致抗蚀剂图案,该第一光致抗蚀剂图案包括形成在漏电极的一部分上和像素区域上的第一部分以及第二部分,其中,第二部分比第一部分厚,然后构图使用第一光刻胶图案的第三钝化膜,通过去除第一光刻胶图案的第一部分来形成第二光刻胶图案,在基板上形成透明电极膜,去除第二光刻胶图案和设置在第二光刻胶上的透明电极膜模式;在第二钝化层上形成透明电极图案。

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