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Method of forming a coating with controlled grain size and morphology for enhanced wear resistance and toughness

机译:形成具有受控的晶粒尺寸和形态以增强耐磨性和韧性的涂层的方法

摘要

Wear resistance of the prior-art Ti(C,N) layers can be considerably enhanced by optimizing the grain size and microstructure. This invention describes a method to obtain controlled, fine, equiaxed grain morphology in Ti(C,N) layers produced using moderate temperature CVD (MTCVD). The method includes the step of doping using CO, CO2, ZrC14 and A1C13 or combinations of these to control the grain size and shape. Doping has to be controlled carefully in order to avoid nanograined structures and oxidization. Doping is further controlled to produce grain size that is from about 50 to about 300 nm, preferably from about 50 to about 150; a lack of any strong preferred growth orientation; and a length-to-width ratio (L/W) of less than 3 and only with a slight to moderate XRD line broadening.
机译:通过优化晶粒尺寸和微观结构,可以大大提高现有技术的Ti(C,N)层的耐磨性。本发明描述了一种在使用中温CVD(MTCVD)生产的Ti(C,N)层中获得可控的,细等轴晶粒形态的方法。该方法包括使用CO,CO 2 ,ZrC1 4 和AlC1 3 或它们的组合掺杂以控制晶粒尺寸和形状的步骤。 。必须小心控制掺杂,以避免纳米晶粒结构和氧化。进一步控制掺杂以产生约50至约300nm,优选约50至约150nm的晶粒尺寸;优选约50至约150nm。缺乏任何强烈的优先增长方向;并且长宽比(L / W)小于3,且XRD线的宽度稍有中度。

著录项

  • 公开/公告号US7927663B2

    专利类型

  • 公开/公告日2011-04-19

    原文格式PDF

  • 申请/专利权人 SAKARI RUPPI;

    申请/专利号US20070783816

  • 发明设计人 SAKARI RUPPI;

    申请日2007-04-12

  • 分类号C23C16/36;

  • 国家 US

  • 入库时间 2022-08-21 18:10:09

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