首页> 外国专利> Method for evaluating microstructures on a workpiece based on the orientation of a grating on the workpiece

Method for evaluating microstructures on a workpiece based on the orientation of a grating on the workpiece

机译:基于光栅在工件上的取向来评估工件上的微结构的方法

摘要

In a measuring system, a method for evaluating parameters of a workpiece includes measuring a periodic structure, such as a grating, on the workpiece to produce image data. An orientation of features in the image data, produced by higher order diffractions from the periodic structure, is identified. An orientation of the periodic structure is determined based on the orientation of the features in the image data. The image data is then modified, based on the orientation of the periodic structure, to correlate with, and for comparison to, simulated image data to ascertain parameters of the workpiece. Alternatively, optical components in the measuring system, or the workpiece itself, are adjusted to provide a desired alignment between the optical components and the periodic structure. A microstructure on the workpiece may then be measured, and the resulting image data may be compared to the simulated image data to ascertain parameters of the microstructure.
机译:在测量系统中,一种用于评估工件的参数的方法包括:测量工件上的周期性结构,例如光栅,以产生图像数据。识别图像数据中特征的方向,该特征是由周期性结构的高次衍射产生的。基于图像数据中的特征的取向来确定周期性结构的取向。然后,基于周期性结构的取向来修改图像数据,以与模拟图像数据相关并进行比较,以确定工件的参数。或者,调整测量系统中的光学组件或工件本身,以在光学组件和周期性结构之间提供所需的对齐方式。然后可以测量工件上的微结构,并且可以将所得图像数据与模拟图像数据进行比较,以确定微结构的参数。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号