首页> 外国专利> Wavefront refractions and high order aberration correction when wavefront maps involve geometrical transformations

Wavefront refractions and high order aberration correction when wavefront maps involve geometrical transformations

机译:当波前图涉及几何变换时,波前折射和高阶像差校正

摘要

Wavefront measurements of eyes are typically taken when the pupil is in a first configuration in an evaluation context. The results can be represented by a set of basis function coefficients. Prescriptive treatments are often applied in a treatment context, which is different from the evaluation context. Hence, the patient pupil can be in a different, second configuration, during treatment. Systems and methods are provided for determining a transformed set of basis function coefficients, based on a difference between the first and second configurations, which can be used to establish the vision treatment.
机译:当瞳孔在评估环境中处于第一配置时,通常会进行眼睛的波前测量。结果可以由一组基函数系数表示。规范性治疗通常在治疗环境中应用,这与评估环境不同。因此,在治疗期间,患者瞳孔可以处于不同的第二构造。提供了用于基于第一和第二配置之间的差异来确定基函数系数的变换集合的系统和方法,该系统和方法可用于建立视觉治疗。

著录项

  • 公开/公告号US7967436B2

    专利类型

  • 公开/公告日2011-06-28

    原文格式PDF

  • 申请/专利权人 GUANG-MING DAI;

    申请/专利号US20100725575

  • 发明设计人 GUANG-MING DAI;

    申请日2010-03-17

  • 分类号G02C7/02;

  • 国家 US

  • 入库时间 2022-08-21 18:09:23

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