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Systems and methods for determination of focus and telecentricity, amelioration of metrology induced effects and application to determination of precision bossung curves
Systems and methods for determination of focus and telecentricity, amelioration of metrology induced effects and application to determination of precision bossung curves
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机译:用于确定焦点和远心度,改善度量引起的影响的系统和方法,以及用于确定精密凸台曲线的系统和方法
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摘要
An apparatus and method for the simultaneous determination of focus and source boresighting error for photolithographic steppers and scanners is described. A reticle containing custom arrays of box-in-box test structures specifically designed for performing source or exit pupil division using an aperture plate is exposed onto a resist coated wafer several times. The resulting exposure patterns are measured with a conventional overlay tool. The overlay data is processed with a slope-shift algorithm for the simultaneous determination of both focus and source telecentricity as a function of field position. Additionally, methods for ameliorating metrology induced effects and methods for producing precision Bossung curves are also described. This Abstract is provided for the sole purpose of complying with the Abstract requirement rules, it shall not be used to interpret or to limit the scope or the meaning of the claims.
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