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Stripper containing an acetal or a ketal for removing post-etched phot-resist, etch polymer and residue
Stripper containing an acetal or a ketal for removing post-etched phot-resist, etch polymer and residue
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机译:含有乙缩醛或缩酮的剥离剂,用于去除蚀刻后的耐光蚀剂,蚀刻聚合物和残留物
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摘要
The current invention describes a formulation comprising of acetal or ketal as a solvent, a polyhydric alcohol, water and pH adjuster. These formulations should have a pH at least 7 or higher. Formulations in this invention can optionally contain watersoluble organic solvents as co-solvent, corrosion inhibitors and fluorides. The formulations in this invention can be used to remove post-etched organic and inorganic residue as well as polymeric residues from semiconductor substrates.
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