首页> 外国专利> A METHOD FOR DESIGNING A DIFFRACTION GRATING STRUCTURE AND A DIFFRACTION GRATING STRUCTURE

A METHOD FOR DESIGNING A DIFFRACTION GRATING STRUCTURE AND A DIFFRACTION GRATING STRUCTURE

机译:衍射光栅结构的设计方法和衍射光栅结构

摘要

According to the present invention, the method for designing a diffraction grating structure (1), the grating period (d) of the structure comprising at least two grating lines each consisting of a pair of adjacent pillars (2) and grooves (3), comprises the steps of - determining desired diffraction efficiencies ηd of the diffraction orders, and - dimensioning the pillars (2) and grooves (3) so that when calculating for each pillar, on the basis of the effective refractive index neff for the fundamental wave mode propagating along that pillar, the phase shift Φ experienced by light propagated through the grating structure, the differences in the calculated phase shifts between adjacent pillars corresponds to the phase profile Φr required by the desired diffraction efficiencies.
机译:根据本发明,一种用于设计衍射光栅结构的方法(1),该结构的光栅周期(d)包括至少两条光栅线,每条光栅线均由一对相邻的支柱(2)和凹槽(3)组成,包括以下步骤:-确定衍射级的所需衍射效率ηd;以及-确定支柱(2)和凹槽(3)的尺寸,以便在计算每个支柱时,基于基波模式的有效折射率neff沿着该柱传播的光通过光栅结构传播时会经历相移Φ,计算出的相邻柱之间的相移之差对应于所需衍射效率所需的相位曲线Φr。

著录项

  • 公开/公告号EP2118693A4

    专利类型

  • 公开/公告日2011-08-10

    原文格式PDF

  • 申请/专利权人 NANOCOMP LTD.;

    申请/专利号EP20070704812

  • 申请日2007-02-23

  • 分类号G02B5/18;

  • 国家 EP

  • 入库时间 2022-08-21 17:57:37

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