首页> 外国专利> METHOD FOR FOCUSING AN AXISYMMETRICAL RADIATION FLOW GENERATED BY A WAVE-TYPE SOURCE AND OPTICAL SYSTEM FOR IMPLEMENTING SAME

METHOD FOR FOCUSING AN AXISYMMETRICAL RADIATION FLOW GENERATED BY A WAVE-TYPE SOURCE AND OPTICAL SYSTEM FOR IMPLEMENTING SAME

机译:求解由波源和光学系统产生的轴对称辐射流的实现方法

摘要

The invention relates to a method that comprises splitting a radiation flow (1) into a series of elementary beams (3). The method comprises using an optical structure (4) having a rotational symmetry property. The structure (4) is organized using a set of identical optical members (5) having at least one reflecting surface. Each of said optical members (5) is used for separating an elementary beam (3) from the flow (1) and for modifying the propagation direction thereof relative to the flow (1). The reflecting surfaces of the optical members (5) are arranged in the form of surfaces having a dual curvature and extending in a radial direction from the axis of symmetry (6) of the flow (1). The reflecting surfaces of the optical members (5) are limited by continuous space curves (8) extending in the vicinity of said axis (6), and said surfaces are used for defining in each elementary beam (3) a set of oblique rays having a focus F located beyond the limits of the axis of symmetry (6). The optical system includes the following structures and members: an optical structure (4) having a rotational symmetry property. The structure (4) is organized using a set of identical optical members (5) each including at least one reflecting surface. Each of the optical members (5) is formed so as to be capable of separating an elementary beam (3) from the radiation flow (1) and of modifying the propagation direction of the elementary beam (3) relative to the flow (1). The reflecting surfaces of the optical members (5) define a means for forming in each beam (3) a set of oblique rays having a focus F located beyond the limits of the axis of symmetry (6), including at the infinity. The reflecting surfaces of the optical members (5) are made in the form of surfaces having a dual curvature and extending in the radial direction from the axis (6) of the radiation flow (1), and are limited by continuous space curves (8) extending in the vicinity of said axis (6).
机译:本发明涉及一种方法,该方法包括将辐射流(1)分成一系列基本光束(3)。该方法包括使用具有旋转对称特性的光学结构(4)。使用具有至少一个反射表面的一组相同的光学构件(5)来组织结构(4)。每个所述光学构件(5)用于从流(1)中分离出基本光束(3),并且用于改变其相对于流(1)的传播方向。光学构件(5)的反射表面以具有双曲率并且从流体(1)的对称轴(6)沿径向延伸的表面的形式布置。光学构件(5)的反射表面被在所述轴线(6)附近延伸的连续空间曲线(8)所限制,并且所述表面用于在每个基本光束(3)中限定一组具有焦点F超出对称轴(6)的范围。该光学系统包括以下结构和构件:具有旋转对称特性的光学结构(4)。使用一组相同的光学构件(5)来组织结构(4),每个光学构件包括至少一个反射表面。每个光学构件(5)形成为能够从辐射流(1)中分离出基本光束(3),并且能够改变基本束(3)相对于流(1)的传播方向。 。光学构件(5)的反射表面限定用于在每个光束(3)中形成一组倾斜射线的装置,该组倾斜射线的焦点F位于对称轴(6)的界限之外,包括无限远处。光学构件(5)的反射面形成为具有双曲率并且从放射线束(1)的轴线(6)沿径向延伸的表面,并受到连续的空间曲线(8)的限制。 )在所述轴线(6)附近延伸。

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