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METHOD FOR FOCUSING AN AXISYMMETRICAL RADIATION FLOW GENERATED BY A WAVE-TYPE SOURCE AND OPTICAL SYSTEM FOR IMPLEMENTING SAME
METHOD FOR FOCUSING AN AXISYMMETRICAL RADIATION FLOW GENERATED BY A WAVE-TYPE SOURCE AND OPTICAL SYSTEM FOR IMPLEMENTING SAME
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机译:求解由波源和光学系统产生的轴对称辐射流的实现方法
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摘要
The invention relates to a method that comprises splitting a radiation flow (1) into a series of elementary beams (3). The method comprises using an optical structure (4) having a rotational symmetry property. The structure (4) is organized using a set of identical optical members (5) having at least one reflecting surface. Each of said optical members (5) is used for separating an elementary beam (3) from the flow (1) and for modifying the propagation direction thereof relative to the flow (1). The reflecting surfaces of the optical members (5) are arranged in the form of surfaces having a dual curvature and extending in a radial direction from the axis of symmetry (6) of the flow (1). The reflecting surfaces of the optical members (5) are limited by continuous space curves (8) extending in the vicinity of said axis (6), and said surfaces are used for defining in each elementary beam (3) a set of oblique rays having a focus F located beyond the limits of the axis of symmetry (6). The optical system includes the following structures and members: an optical structure (4) having a rotational symmetry property. The structure (4) is organized using a set of identical optical members (5) each including at least one reflecting surface. Each of the optical members (5) is formed so as to be capable of separating an elementary beam (3) from the radiation flow (1) and of modifying the propagation direction of the elementary beam (3) relative to the flow (1). The reflecting surfaces of the optical members (5) define a means for forming in each beam (3) a set of oblique rays having a focus F located beyond the limits of the axis of symmetry (6), including at the infinity. The reflecting surfaces of the optical members (5) are made in the form of surfaces having a dual curvature and extending in the radial direction from the axis (6) of the radiation flow (1), and are limited by continuous space curves (8) extending in the vicinity of said axis (6).
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