首页> 外国专利> Laser irradiation apparatuses and methods using a beam expander with two lenses, the position of the latter with respect to the laser oscillator governed by an equation

Laser irradiation apparatuses and methods using a beam expander with two lenses, the position of the latter with respect to the laser oscillator governed by an equation

机译:使用具有两个透镜的扩束器的激光辐照设备和方法,后者相对于激光振荡器的位置由方程式控制

摘要

The present invention provides a laser irradiation apparatus and a laser irradiation method which can reduce displacement of entrance point of laser light into a diffractive optical element (103), when laser light enters the diffractive optical element (103) through a beam expander optical system (102). When the scale of laser light emitted from a laser oscillator (101) is enlarged through a beam expander optical system (102) including two lenses (102a,102b), and the laser light enters the diffractive optical element (103), the emission point of the laser light and the first and second lenses (102a,102b) are arranged such that the positions of the emission point of the laser light and the second lens (102b) are conjugate to each other by the first lens (102a).
机译:本发明提供了一种激光照射装置和激光照射方法,当激光通过扩束器光学系统进入衍射光学元件(103)进入衍射光学元件(103)时,其可以减少激光进入衍射光学元件(103)的入射点的位移。 102)。当通过包括两个透镜(102a,102b)的扩束器光学系统(102)使从激光振荡器(101)发射的激光的规模放大,并且激光进入衍射光学元件(103)时,发射点第一透镜102b和第二透镜102a,102b被布置成使得激光的发射点的位置和第二透镜102b的发射点的位置通过第一透镜102a彼此共轭。

著录项

  • 公开/公告号EP2275222A1

    专利类型

  • 公开/公告日2011-01-19

    原文格式PDF

  • 申请/专利权人 SEMICONDUCTOR ENERGY LABORATORY CO. LTD.;

    申请/专利号EP20100013508

  • 发明设计人 TANAKA KOICHIRO;

    申请日2007-07-10

  • 分类号B23K26/06;B23K26/08;B23K26;G02B27/09;B23K101/40;

  • 国家 EP

  • 入库时间 2022-08-21 17:55:51

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