首页> 外国专利> LITHOGRAPHY APPARATUS FOR DETECTING THE TWO PHASE FLOW AND A METHOD OF MEASURING THE SPEED OF TWO PHASE FLOW

LITHOGRAPHY APPARATUS FOR DETECTING THE TWO PHASE FLOW AND A METHOD OF MEASURING THE SPEED OF TWO PHASE FLOW

机译:检测两相流的光刻设备和测量两相流速度的方法

摘要

PURPOSE: A lithography apparatus for detecting the two phase flow and a method of measuring the speed of two phase flow are provided to measure the gas flow and speed of the liquid flow using the flow meter after separating the two phase flow into the gas flow and the liquid flow.;CONSTITUTION: A flow separator separates the two phase flow into the gas flow and the liquid flow. A first flow meter(260) measures the fluid flow speed of the gas flow or the liquid flow. A second flow meter(262) measures the fluid flow speed of the other out of the gas flow and the liquid flow. The first and second flow meters offer the signal showing the measured speed to a controller(300).;COPYRIGHT KIPO 2011
机译:目的:提供一种用于检测两相流的光刻设备和一种测量两相流的速度的方法,以在将两相流分离为气体流和气体后,使用流量计测量气体流和液体流的速度。组成:分流器将两相流分为气体流和液体流。第一流量计(260)测量气流或液体流的流体流速。第二流量计262测量气体流量和液体流量中的另一个的流体流速。第一和第二流量计将表示测得速度的信号提供给控制器(300)。; COPYRIGHT KIPO 2011

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