首页> 外国专利> PHOTOCURABLE RESIN COMPOSITION WITH ANTISTATICITY AND EXCELLENT ABRASION RESISTANCE AND AN OPTICAL FILM MANUFACTURED USING THE RESIN COMPOSITION

PHOTOCURABLE RESIN COMPOSITION WITH ANTISTATICITY AND EXCELLENT ABRASION RESISTANCE AND AN OPTICAL FILM MANUFACTURED USING THE RESIN COMPOSITION

机译:具有抗静电性和优异耐磨性的可光固化树脂组合物,以及使用该树脂组合物制备的光学膜

摘要

PURPOSE: A photocurable resin composition is provided to ensure excellent antistatic property, surface resistance property, transparency, scratch resistance, and adhesive force to various materials.;CONSTITUTION: An antistatic photocurable resin composition includes photopolymerizable urethane acrylate, reactive monomers, photoinitiator, antistatic agent and leveling agent. The photopolymerizable urethane acrylate is included in the amount of 20~60 weight% based on the total weight. A method for preparing the antistatic photocurable resin composition comprises the steps of: injecting a photopolymerizable urethane acrylate oligomer, reactive monomer, photoinitiator, antistatic agent and leveling agent; and stirring the injected materials using an impeller.;COPYRIGHT KIPO 2011
机译:目的:提供一种光固化树脂组合物,以确保优异的抗静电性能,表面电阻性能,透明性,耐刮擦性和对各种材料的粘合力。;组成:一种抗静电光固化树脂组合物,包括光聚合聚氨酯丙烯酸酯,反应性单体,光引发剂,抗静电剂和流平剂。以总重量为基准计,光聚合聚氨酯丙烯酸酯的含量为20〜60重量%。一种制备抗静电光固化树脂组合物的方法,包括以下步骤:注入可光聚合的氨基甲酸酯丙烯酸酯低聚物,反应性单体,光引发剂,抗静电剂和流平剂。并使用叶轮搅拌注入的材料。; COPYRIGHT KIPO 2011

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